Recent publications

Kautzsch,T.; Scire,A.; Voigtländer,K.
A Trench Gate Photo Cell for Spectrometric Applications

2013 IEEE International Electron Devices Meeting (IEDM 2013), Dec. 2013 Washington,DC,USA   
http:\\ieeexplore.ieee.org

Holger Lebrecht, Knut Voigtländer, Robert Griesbeck
An innovative R2R control MIMO approach for the furnace area

ISMI Manufacturing Week 2011, October 2011, Austin / Texas, USA
ISMI_MW2011.pdf

Michael Rettelbach, Peter Doherr, Andreas Thamm, Roland Beier,
Jan Zimpel, Knut Voigtländer
Modular approach for High volume data analysis - modelling, visualizaiton and reporting

11 th European AEC/APC Conference, April 2011, Dresden, Germany
AECAPC_2011.pdf

Ute Nehring; Tilo Wünsche; Michael Rettelbach; Jan Zimpel
Automated Full Line Excursion Analysis using Time Resolved FDC with Panama
10 th European AEC/APC Conference, April, 2010, Catania, Italy
AECAPC_2010.pdf

Wehring, S..; Reinhold, F.; Zimpel, J.; Igel, T.:
R2R control of CMP PSG process by adjusted zone pressures and polish time

8 th European AEC/APC Conference, April 18.-20. 2007, Dresden Germany
AECAPC_Europe_2007_R2RControl.ppt (2.7 Mb)

Wünsche, T..; Rudolph, M.; Zimpel, J.:
Virtual Metrology to Measure MassLoss at Deep Trench Processes

8 th European AEC/APC Conference, April 18.-20. 2007, Dresden Germany
AECAPC_Europe_2007_Virtual Metrology.ppt (1.9 Mb)

Hoffmann, F..; Voigtländer, K.:
Combining full IEP spectrum with an interferometric signal for depth etch endpoint detection

8 th European AEC/APC Conference, April 18.-20. 2007, Dresden Germany
AECAPC_Europe_2007_EndPointDetection.ppt (1.0 Mb)

Behrisch, A..; Zimpel, J.:
Interaction of Process data and Non Productive data - a general approach

6 th European AEC/APC Conference, April 05.-08. 2005, Dublin Ireland
AECAPC_Europe_2005_InteractionOfData.ppt (0.9 Mb)

Thamm, A..; Voigtländer, K.; Zimpel, J.; Marx, E.:
Online-CD and -excursion monitoring in deep trench Si RIE etching using optical emission spectroscopy for future R2R applications

6 th European AEC/APC Conference, April 05.-08. 2005, Dublin Ireland
AECAPC_Europe_2005_OESinSiRIEetching.PDF (0.9 Mb)

Knobloch, D.; Denzer, U.; Zimpel, J.:
Three Applications of OES in Plasma Processing: Endpoint Control, On-line Fault Detection, Process Diagnostics

4th European AEC/APC Conference, March 26.-28. 2003, Grenoble France
AECAPC_Europe_2003_OESinPlasmaProc.jpg (1.4 Mb)

Behrisch, A.; Knobloch, D.; Voigtländer, K.:
Approaches for decomposition of APC-Trace data - a case study.

4th European AEC/APC Conference, March 26.-28. 2003, Grenoble France
AECAPC_Europe_2003_APCTraceData.jpg (1.4 Mb)

Knobloch, D.; Bell, F.; Voigtländer, K.; Zimpel, J.:
Introduction of a powerful new method of generating accurate endpoint traces combined with process fault classification for low dimensional areas

49th International Symp. American Vacuum Society. 2002, Denver Colorado
AVS_Denver_2002_OES.jpg (1.3 Mb)

Zimpel, J.; Voigtländer K.; Knobloch, D.:
A new model based method for generating superior endpoint traces using full range optical emission spectroscopy.

AEC/APC Symposium XIII 2001, October 6.-11. 2001, Banff Springs Alberta
ModelEp.pdf (780 kb)

Zimpel, J.; Voigtländer K.; Behrisch, A.:
PCA-Based Fault Detection in High-Volume Production Using Machine Data.
AEC/APC Workshop II Europe 2001, April 19.-20. 2001, Dresden Germany
ApcFdc.pdf (604 kb)

Voigtländer, K.:
Ein Beitrag zur Modellierung und Regelung nichtlinearer dynamischer Systeme mittels neuronaler Strukturen.
Dissertation, Shaker Verlag, Aachen 2000
diss.pdf (110 kb)

Voigtländer K.; Zimpel, J.; Steinbach, A.; Knobloch, D.:
Using Multiway-PCA (MPCA) for Advanced Monitoring and Diagnostics for Plasma Processing based on optical emission spectroscopy.

AEC/APC Workshop XII 2000, October 6.-11. 2000, Lake Tahoe Colorado
PlasmaMpca.pdf (1.2 Mb)

Zimpel, J.; Voigtländer, K.; Steinbach, A.:
Advanced Plasma Monitoring and Endpoint Detection based on optical emission spectroscopy in industrial environment.

AEC/APC Workshop Europe 2000, March 30.-31. 2000, Dresden Germany
PlasmaOes.pdf (736 kb)

Voigtländer, K.; Wilfert, H.-H.:
Filter-chain models for identification of nonlinear dynamical systems.

3rd MATHMOD; IMACS Symposium on Mathematical Modeling, February 3.-5. 2000, Technical University Vienna, pp. 547-552.
FilterChain.pdf (153 kb)

Knobloch, D.; Bell, F.; Zimpel, J.; Voigtländer, K.:
Supervision of Plasma Processes using Multi-Way Principal Component Analysis.

47th International Symp. American Vacuum Society. Boston, MA, October 2-6. 2000.
OesMpca.pdf (327 kb)

Bell, F.; Knobloch, D.; Zimpel, J.; Voigtländer, K.:
Real time tun-to-run process control of plasma processes using internal machine and external sensor data. 46th International Symp.

American Vacuum Society. Seattle, WA, October 25-29. 1999.
R2rApc.pdf (515 kb)

Knobloch, D.; Bell, F.; Zimpel, J.; Voigtländer, K.: Using optical emission spectroscopy (OES) to monitor different parameters for a contact hole etch process between wet clean. 46th International Symp. American Vacuum Society. Seattle, WA, 25-29. October, 1999.
OesCt.pdf (845 kb)

Knobloch, D.; Bell, F.; Steinbach, A.; Zimpel, J.:
Improvement of Process and Equipment Performance using Online and Real Time Optical Emission Spectroscopy.

45th International Symp. American Vacuum Society, Baltimore/Maryland, November 2.-6. 1998
RtOes.pdf (1.4 Mb)